Thin Tin and Tio2 Film Deposition in Glass Samples by Cathodic Cage

Rômulo Ribeiro Magalhães de Sousa,Clodomiro Alves Júnior,Thercio Henrique de Carvalho Costa,Igor Oliveira Nascimento,Michelle Cequeira Feitor,Francisco Eroni Paes Santos,Francisco Odolberto de Araújo

doi:10.1590/1516-1439.313914

Abstract

Thin nitride and titanium dioxide films were produced using an innovative technique called cathodic cage depositon. Uniformity, three-dimensionality and high rate deposition are some of the advantages of this technique. In this study we discuss the influences of temperature, treatment time and gaseous atmosphere on the characteristics of the deposited films. The TiN (titanium nitride) and TiO2 (titanium dioxide) films were produced using a high deposition rate of 2,5 µm/h at a work temperature and pressure of 400°C and 150 Pa respectively. EDS technique was used to identify the chemical composition of the thin film deposited, whilst Raman spectroscopy indicated the phases present confirmed by DRX analysis. The thickness of the deposited films was studied using electron microscopy scanning. The results based on the deposition parameters confirm the great efficiency and versatility of this technique, which allows a uniform three-dimensional film deposition on any material without the appearance of stress. Compared to other techniques, cathodic cage deposition enables deposition at lower temperatures and higher pressures.

Highlights

To deposit titanium films, samples were positioned on an isolated alumina disc totally enclosed in a metallic cage
Plasma was produced in the cathodic cage, which works as a hollow cathode and not directly on sample surfaces, which remain as a floating potential positioned on an insulating surface
The Glass is common composed by 72% silica dioxide (SiO2), 14% Sodium oxide (Na2O); 9% Calcium Oxide (CaO); 4% Magnesium Oxide (MgO); 0,7% Aluminium Oxide (Al2O3) and 0,3% Potassium Oxide (K2O)

Summary

Introduction

Samples were positioned on an isolated alumina disc totally enclosed in a metallic cage This technique is known as cathodic cage deposition which ensures that plasma acts on the cage and not on the samples surfaces eliminating problems inherent in conventional nitriding[1,2,3,4]. It allows the treatment of metallic and insulating materials, as well as the deposition of layers on different substrates. The great advantage of this process is that it is very versatile, simple and low cost

Methods

Results

Conclusion