Abstract
Summary form only given. Thin polymer layers (TPL) on solid substrates are widely used in science and technology. Fields of application cover microelectronics (polymer resists in lithographic process, dielectric, protective and other functional layers), sensor technologies and nonlinear optics. Polymerization of monomer directly on a surface of substrates is a new, perspective method of TPL formation. Process of electron beam vapour deposition polymerization (E-VDP) is considered at beam energy 1-100keV. Technological features of this method are: a) absence of organic solvents; b) an opportunity of selective deposition of a polymeric layer, only on those sites of a surface, which were irradiated by an initiating electron beam; c) wide opportunities of electron beam parameter control and, accordingly, control of the speed of deposition, topology and properties of formed polymeric layers.
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