Thin molecular sieve films on noble metal substrates

Abstract

A novel method whereby dense thin microporous films less than 300 nm thick may be prepared on noble metal substrates is exemplified by the deposition of silicalite-1 on a gold surface in a three-step process. The gold surface is modified with a silane coupling agent, gamma-mercaptopropyltrimethoxysilane, after which the silane is hydrolyzed to yield a negatively charged interface. Positively charged colloidal silicalite-1 crystals are readily adsorbed as a monolayer upon this surface and are induced to crystallize further in a separate hydrothermal treatment step to yield a dense thin silicalite-1 film.