Abstract
This paper reports design and development of thin metallic(Al/Ag) film X-band waveguide terminations. The reflectivity data for several such terminations measured experimentally at 8.5, 9.5, 11, & 12 GHz on HP 8410B network analyzer system are given here. The theoretical background and calculated values of the surface resistance of thin films from the measured reflection coefficients data for the terminations are also presented.
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