Abstract
ABSTRACTIn order to enhance the utility of Pulsed Laser Deposition (PLD), a method to deposit uniform films has been devised. This method employs the deposition profile produced by PLD and the discrete nature of the process. We have simulated this process using experimentally determined deposition profiles and have used the results to design a system that produces films of uniform thickness to within a few percent across a substrate of 1 inch diameter and have obtained excellent agreement between theory and experiment.
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