Abstract
Atomic layer deposition (ALD), a technique based on vapor-phase, enables the deposition of ultrathin and conformal films on a variety of substrates; particles, tubes, fibers, and faceted surfaces. The exceptional conformality of ALD films and molecular-level control in the thickness and composition have attracted a great interest to functionalize nanoscale surfaces recently. In particular, such abilities of ALD have been capable of engineering surfaces of each component of Sensitized Solar Cells for improving the performance and reliability. Gregory N. Parsons and co-workers describe recent advances in this field in progress report 1600354.
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