Abstract
AbstractThe mobility limiting scattering mechanisms for amorphous semiconductors and polar polycrystalline semiconductors are studied in the context of developing new high‐performance thin‐film transistor (TFT) channel layer materials for large‐area electronics. A physics‐based model for carrier transport in an amorphous semiconductor is developed to estimate the mobility limits of amorphous semiconductor TFTs. The model involves band tail state trapping of a diffusive mobility. Simulation reveals a strong dependence on the band tail density of states. This consideration makes it difficult to realize a high‐performance p‐type oxide TFT. A polar crystalline semiconductor may offer a higher mobility but is fundamentally limited by polar optical phonon scattering. Any crystalline TFT channel layer for practical large‐area applications will not be a single crystal but polycrystalline, and therefore, grain size and grain boundary‐dependent scattering will further degrade the transport properties.
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