Thin film techniques for solid oxide fuel cells

Abstract

Electrochemical vapor deposition (EVD) is a key technology for making thin layers of the solid electrolyte as well as the interconnection material of the solid oxide fuel cell (SOFC). In addition to EVD several advanced deposition techniques for SOFC components and SOFC stacks have recently been reported. Among these techniques are thermal spraying and laser spraying techniques, while the chemical aerosol deposition technology holds promise for utilisation in SOFC technology. One of the major drawbacks of gas-phase deposition techniques is the low growth rate. To circumvent this problem a combination of the EVD process and thermophoresis assisted chemical vapor deposition (TA-CVD) has been developed by the present authors. This latter process is also referred to as particle precipitation aided-CVD (PP-CVD). With the PP-CVD technique growth rate increases in the order of 100–1000 can be achieved. The principles of these advanced deposition techniques will be reviewed. Characteristics of layers of SOFC components and SOFC stacks will be discussed.