Thin film formation processes controlled by the momentum parallel to the substrate surface

Abstract

Surface electronic structures of adsorbed nitrogen atoms on the oxidized nickel substrate were investigated by angle-resolved transmission current spectroscopy in a magnetic field. The density distributions of d I t( k θ, k r )/d B and d I t( k θ, k r )/d V in a two-dimensional wave number vector ( k θ, k r )-space strongly depended on the gas pressure. The surface structure changed from the disordered layer with the superlattice structure of (110) surface of NiO to the stepped structure due to adsorbed nitrogen atoms on the superlattice. The angle of the stepped structure increased with increasing pressure. The ionization process showed the same angle dependence as that of the adsorbed nitrogen atoms, but the magnitude of the wave number vectors were different from each other because of the binding energy. These results suggested two adsorbed layers on the surface oxide. The shift of the wave number vectors to the direction parallel to the surface with the increase of pressure showed the importance of the momentum parallel to the surface.