Abstract
In this paper we consider the possibilities of thin-film coatings micromachining by femtosecond laser radiation (wavelength λ = 1030 nm, pulse repetition frequency f = 10 kHz, Emax pulse energy ≈ 150 μJ, pulse duration τ ≈ 280 fs) for elements of microelectronics and optoelectronics. Using self-developed software the thin film elements with a given geometry were designed and formed on a surface of the quartz substrate. Examples of the microelements formation by selective laser ablation of a samples with deposited metal coating are shown.
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