Abstract
Hexamethildisiloxane-oxygen fed radiofrequency discharges have been studied under high power density and 0.05÷0.1 torr pressure, i.e., experimental conditions of high monomer fragmentation. Actinometric Optical Emission Spectroscopy of plasma phase, X-Ray Photoelectron Spectroscopy and Infrared Spectroscopy analyses of the deposited films allowed to set the basis of the first “semi-quantitative” mechanism of deposition of siloxane films which can reasonably account for both deposition rates and film compositions. A by-product of the research is the use of CH-to-Ar emission ratio as a probe of carbon content in the film, an important practical parameter for process control.
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