Thin film deposition from dual ion beam sputtering system

Abstract

In this report, we study different device applications which utilizes oxide layers grown by dual ion beam sputtering (DIBS) system. DIBS system is noteworthy since it produces high-quality thin films with reasonably better compositional stoichiometry, small surface roughness and good adhesion to the substrate even for films grown at room temperature. DIBS system parameters affect the oxide and non-oxide layer in a very significant manner and control of these parameters allows for fine-tuning the as-grown thin films specialize for specific applications.