Abstract
The growth of titanium oxide films by means of target evaporation with a high-intensity laser radiation was studied. The experiments were conducted in vacuum, an oxygen atmosphere, an oxygen radiofrequency (RF) discharge plasma, and the plasma afterglow. It was shown that the use of RF discharge and the substrate mounted on the powered electrode makes it possible to preclude the formation of particles with a size above a few micrometers in the films and to increase their oxygen content, refractive index, and transmission coefficient, as well as the deposition rate.
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