Thin film circuits—Part I. The uses of photomechanical processes in the manufacture of micro-miniature circuits

Abstract

This article describes methods of making the master patterns required for microminiature circuits, including a novel way of making very accurate patterns without drafting. Photographic and photo-mechanical processes are described together with full details of making in contact and out of contact masks for subsequent vacuum deposition of resistive, capacitive and conductive films. Details of etching processes for molybdenum masks are given, these masks are suitable for use in the deposition of thin films on to hot substrates without deformation.