Thickness-dependent coercivity of ultrathin Co films on a rough substrate: Cu-buffered Si(111)

Abstract

The hysteresis loops, of Co films with thicknesses ranging from 12- to 80-monolayer-equivalent (MLE) coverages grown by thermal evaporation on a Cu-covered Si(111) surface, were measured in situ by the surface magneto-optic Kerr effect (SMOKE) technique. The hysteresis loops were measured as a function of Co coverage under an external sinusoidal magnetic field at fixed driving frequency. The coercivity H c of the Co film versus thickness t followed a power law t − n with n=0.4±0.1 between 12 and 44 MLE, and stabilized after 44 MLE, up to the 80 MLE studied. The surface morphology of the 80-MLE Co film was imaged ex situ by atomic force microscopy (AFM) and scanning tunneling microscopy (STM), revealing cauliflower-like islands that were rough both in the short and long range. Analysis of the height–height correlation function for the largest image gave measurements of the effective roughness exponent α (∼0.8), the vertical interface width w(∼2500 Å), and the lateral correlation length ξ(∼10 000 Å). We suggest that the coercivity changed in part due to changes in roughness of the Co films, deposited on a rough substrate; the spatial roughness would create an additional surface anisotropy, contributing to a fluctuation in the domain wall energy, resulting in a roughness-dependent coercivity.