Abstract
Silicon nanowires (SiNWs) have been synthesized on gold layer-coated silicon substrates via plasma enhanced chemical vapor deposition method (PECVD). Various thicknesses of Au layers were coated on Si (111) substrates using radio frequency magnetron sputtering. Field emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), energy dispersive X-ray spectroscopy (EDX), and transmission electron microscopy (TEM) were used to characterize the morphology, compositions, and structures of the samples. The results show that the sample consisted of single-crystalline SiNWs with the diameters ranging from 40 to 160nm and length up to 3μm. It was observed that the diameter of SiNWs increases with increasing of Au catalyst layers thickness. Raman spectra display peaks with narrow and asymmetric shape at 518cm−1 for the SiNWs, indicating the high crystalline nature of the samples. A possible growth mechanism is proposed for the formation of nanowires (NWs). It has been found that the features of SiNWs depend on the thickness of Au layers.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
