Abstract
In this study, the thickness dependence of tunability in Ti-doped K(Ta,Nb)O3 thin films is reported. The films were grown using pulsed laser deposition. Doping with Ti reduces losses via acceptor doping. Measurements of interdigitated electrode devices using K(Ta,Nb)O3 films of varying thickness was used to extract the intrinsic thickness dependence of dielectric response. An intrinsic tunability of 11% at 40 kV/cm is determined for epitaxial films on (001) MgO. The intrinsic tunability is suppressed for films less than 100 nm, suggesting the onset of size effects in the nonlinear dielectric response.
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