Abstract
In this work, a series of Fe4N thin films with thickness t = 10, 30, 60, and 120 nm were deposited using a reactive dc magnetron sputtering and studied for their structural and the magnetic properties. X-ray diffraction measurements confirmed the formation of a single-phase Fe4N and the grain size was found to increase up to t = 60 nm. Magnetization measurements were carried out using the bulk magnetization as well as element-specific magnetic circular dichroism. It was found that the saturation magnetization (Ms) maximizes at t = 30 nm. To correlate the observed variation in the Ms, we studied the local structure using near edge and extended X-ray absorption fine structure analysis. The effect of local structure and interatomic distances on the magnetic properties of Fe4N films have been explored and discussed.
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