Abstract
Measurements of “trapped spin wave” edge modes in transversely magnetized stripe arrays of Ni80Fe20 largely confirm previous theoretical predictions for the thickness dependence of the edge saturation field Hsat and the effective out-of-plane edge anisotropy field H2. The stripes were patterned using optical interference lithography with film thicknesses in the range from 10to65nm. Large linewidth values for edge modes relative to bulk modes indicate inhomogeneity of the edges. Elimination of an antireflective coating underlayer dramatically decreases the edge mode linewidth without affecting the bulk mode linewidth.
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