Abstract
Thick magnesium alloy films were prepared by both vapor deposition and sputter deposition techniques. It was found that the properties of the deposited films depend on the substrate material, deposition temperature and release agent, as well as substrate motion. Processing parameters were related to the physical integrity of the deposited film. A direct comparison between an alloy film produced by vapor deposition and an alloy film produced by sputter deposition was also made. It is concluded that sputter deposition is superior to vapor deposition, as the former method can produce a film not only more uniform in thickness, but also with much closer control of chemical composition.
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