Abstract
The design of multifunctional alloys with multiple chemical components requires controllable synthesis approaches. Physical vapor deposition techniques, which result in thin films (<1 μm), have previously been demonstrated for micromechanical devices and metallic combinatorial libraries. However, this approach deviates from bulk-like properties due to the residual stress derived in thin films and is limited by total film thickness. Here, we report a route to obtain ternary Ni-Mn-Sn alloy thick films with controllable compositions and thicknesses by annealing electrochemically deposited multi-layer monatomic (Ni, Mn, Sn) films, deposited sequentially from separate aqueous deposition baths. We demonstrate (1) controllable compositions, with high degree of uniformity, (2) smooth films, and (3) high reproducibility between film transformation behavior. Our results demonstrate a positive correlation between alloy film thicknesses and grain sizes, as well as consistent bulk-like transformation behavior.
Highlights
The design of multifunctional alloys with multiple chemical components requires controllable synthesis approaches
The abrupt decrease of deposition rate after ten minutes was attributed to the reduced counter electrode surface area, which was coated by black manganese oxide during the electrochemical deposition process in the one compartment electrochemical cell
Ni0.5Mn0.5−xSnx alloys were deposited by repeated stacking of 3n-layer monatomic films, in which individual layer thickness was adjusted based on deposition time
Summary
The design of multifunctional alloys with multiple chemical components requires controllable synthesis approaches. Physical vapor deposition techniques, which result in thin films (
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