Abstract
Photolithographically-defined patterned arrays of Co-rich Co-Pt permanent magnets with thicknesses up to 10 mu m were fabricated by aqueous electrodeposition. These micromagnets exhibited strong perpendicular magnetic performance while being deposited at low temperatures (65 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">deg</sup> C) and without the need for post-deposition annealing. Co-Pt magnet arrays grown 10-mu m thick on textured Cu (111) seed layers on Si (110) substrates exhibited coercivities of 330 kA/m (4.1 kOe) and energy products 69 kJ/m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sup> . Additionally, magnets deposited 8-mu m thick on untextured Cu seed layers on standard Si (100) substrates exhibited coercivities up to 260 kA/m (3.3 kOe) and energy products up to 27 kJ/m <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sup> . The high magnetic performance and process integrability of these permanent magnet arrays make them well suited for the development of magnetic microelectromechanical systems (MEMS).
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