Abstract
An expanding cascaded arc plasma is used for the deposition of different types of carbon layers at high growth rates. Single diamond crystals of 60 {mu}m and 25 {mu}m-thick continuous films are deposited within 1 h on areas of {approximately}3 cm{sup 2}. In recent experiments, pyrolytic graphite films have been deposited. Films up to 200 {mu}m thick have been produced within 20 min on an area of {approximately} 12 cm{sup 2}. The film type and growth rate depend on the choice of the optimum reactor parameter settings. To maximize the growth rate and crystallinity of the film, the reactor settings are varied. High growth rates (maximum of 762 nm/s) have been obtained at high temperatures (600 to 1000{degrees}C). Several diagnostic techniques are used to analyze the film. The purity of the films has been confirmed by Auger electron spectroscopy.
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