Abstract

AbstractAn on‐chip integrated one‐dimension topological insulator in the optical communication range is realized directly in an integrated photonic circuit. The system takes on a configuration of a 220 nm thick 1D photonic crystal heterostructure sandwiched between two gold films. A photonic topological edge state centered at 1550 nm is obtained for the chip‐integrated one‐dimension topological insulator made of a silicon/SiO2 photonic crystal heterostructure with a feature size of only 2.25 µm integrated with a silicon waveguide. On/off switching of the photonic topological edge state was also achieved in a 1D topological insulator made of a VO2/SiO2 photonic crystal heterostructure based on a thermally induced insulator‐to‐metal transition of VO2. This system not only paves the way for practical applications of photonic topological insulators in integrated photonic devices and chips but also provides a platform for fundamental studies of topological photonics.

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