Abstract
Black aluminum is characterized by a highly granular structure and porous surface - i.e. the real surface area is several times larger than its geometric projection to the substrate. In addition, it is a metal with good surface gas sorption capacity and structural stability up to temperatures T ∼500 °C.The surface exchange interactions between the ambient environment and thin layers of black aluminum prepared by different methods are described. These properties are convenient for materials that are suitable for the fabrication of active layers of chemiresistors. The layers were prepared by magnetron sputtering at room temperature and liquid nitrogen temperature, and evaporation with different compositions and gas flow rates. In this work, the process of thermally stimulated desorption was measured using mass spectrometry. The calculation of the activation energy Eact for the release of individual desorbing atoms, or radicals, from the surface of black aluminum was performed. Knowing of the temperature and the number of particles released by desorption allows us to get an idea of the number of defects and the functionalized structure of the surface layer.
Published Version
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
