Abstract
Abstract We introduce a Ag-Ag direct bonding process with the aid of ultrasonic bonding, which uses silver “Nano-volcanic eruption of Ag” caused by stress migration at 250 °C. Various preheating temperatures before the ultrasonic pulse and various sputtering methods such as direct current (DC) and radio frequency (RF) have also been evaluated. A novel bonding process which combines ultrasonic bonding and stress migration bonding (SMB) method is established. The bonding achieved a die-shear strength of more than 50 MPa and a nearly-perfect voidless bonding interface. High temperature storage (HTS) test at 250 °C was used to evaluate the thermal-resist ability of bonded SMB joints. The results indicate that the bonded joints show no obvious changes in the interfacial morphology and the die-shear stress after HTS test for 1000 h is still higher than 30 MPa. The thermally-stable SMB joints can be applied to advanced devices such as thin-wafer multi-chip integrations and next-generation power devices.
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