Abstract
Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices.
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