Abstract
ABSTRACTWe have observed for the first time reversible changes in the sheet carrier concentration of the rapid thermally annealed Se and Zn implanted GaAs samples during subsequent heat treatments. The electrical profiles of the implanted samples have also been modified during the annealing processes. By observing the initial rate of change in the carrier concentration, an activation energy of about 2 eV is obtained which is thought to correspond to the diffusion of gallium atoms/vacancies.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
