Abstract
The thermal stability of Si/GexSi1−x/Si (100) heterostructures is studied by in situ electron microscope observations of the thermal relaxation process. Structures are observed to relax by misfit dislocation propagation at both strained interfaces, and are stable to significantly higher temperatures than equivalent strained GexSi1−x layers at a free surface. This observed difference in thermal stability between double and single interface structures is due at least in part to much lower dislocation velocities in the double interface structures, with a measured glide activation energy approximately twice as high as single interface structures. It is argued that this difference in glide activation energies may be due to a smaller kink nucleation activation energy in the single interface structure.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.