Abstract
Contact angle measurements and scanning force microscopy (SFM) have been used to study the morphology of self-assembled monolayers of octadecyltrichlorosilane (OTS) and undecyltrichlorosilane (UTS) on silicon oxide surfaces as a function of annealing temperature. Characterization of the monolayers before annealing indicates that the as-formed monolayers cover the substrate fully and have thicknesses of 2.9 and 1.5 nm, respectively, with the average surface having a roughness of approximately 0.3 nm. Water contact angle results and SFM roughness analysis showed that UTS monolayers annealed for 2 h at temperatures over 125 °C exhibited permanent changes in monolayer structure. Experimental data indicated a higher transition temperature for permanent structural changes for the OTS monolayers. Water contact angle measurements indicated a transition centered at 125 °C, hexadecane contact angle measurements indicated a transition around 130 °C, and SFM indicated a transition centered at 155 °C for OTS monolayer...
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