Abstract
Thin films composed of silicon square-spirals in a square-lattice array are fabricated using glancing angle deposition and thermally oxidized at 600°C, 700°C, 800°C, 900°C and 1000°C. The filling fraction of the square-spiral morphology increases from approximately 0.4 to values between 0.5 and 0.7, depending on oxidation temperature. Maximum filling fraction increase, and thin film expansion, is observed at 700°C. Complete oxidation is achieved for oxidation temperatures of 700°C and greater. This range of filling fractions is appropriate for a square-spiral template, which could be used to create the inverse silicon square-spiral photonic crystal structure using a template inversion process.
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