Abstract
The paper gives an overview of state of the art models and techniques for simulation of thermal effects in RTP, RTCVD and CVD reactors. The methods are exemplified with recent applications. The examples include the investigation of susceptively-heated single wafer reactors including effects related to optical properties of the wafer. Natural convection and wafer rotation are discussed in a further example. The steady state and transient uniformity control in a RTP system is treated together with a method to supplement simulation with experimental data. As a recent topic the thermal and gravitational stress in 300 mm wafer is discussed.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.