Abstract
This paper presents the results of theoretical modeling and experimental studies of thermal hysteresis in holmium (Ho) thin films with a thickness of 200 nm at applied magnetic fields of 100 Oe, 1 kOe, and 10 kOe. The isofield magnetization curves, measured at 100 Oe and 1 kOe do not exhibit hysteresis during the heating and cooling processes. In contrast, M(T) measured at 10 kOe shows significant differences between the heating and cooling processes. The thermal hysteresis width covers almost the entire range between the Curie temperature (TC) and Néel temperature (TN) and is controlled by the external magnetic field. The peculiarities of the magnetic phase diagram of thin films in comparison with the bulk samples of Ho are also discussed.
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