Abstract
Titanium metal layers of different thicknesses were deposited on optical glass, quartz and ceramic at 50 °C and 150 °C substrate temperatures with the help of magnetron deposition. The metal layers were converted into a rutile phase of TiO2 at different annealing temperatures. The effect of thermal annealing on the morphology and the refractive index of the thin film was investigated. The film’s quality and roughness were found to depend on the substrate’s temperature during metal film deposition and on the annealing temperature. The TiO2 thin films obtained on ceramic and glass substrates were seem to show less surface roughness at low substrate temperature as compared to the quartz substrate.
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