Abstract
Thermal reactions between a fluorocarbon ( CFx ) layer formed with C4F8 magnetomicrowave plasma and Si and SiO2 are studied by thermal desorption spectroscopy (TDS). Atomic compositions and core spectra of the CFx layer are measured by temperature-programmed X-ray photoelectron spectroscopy (TP-XPS) with concomitant desorption gas species analysis by quadrupole mass spectrometer. The TDS study reveals that the primary reaction products are SiF4 in Si and SiF4 and CO in SiO2, and F generated from the CFx layer is a primary reactive species contributing to the formation of the reaction products not only in Si but also in SiO2. The TP-XPS study reveals that the drastic decrease of F/C ratio agrees with the desorption of SiF4 and CO.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
