Abstract
AbstractExperiments on chemical vapor deposition of W(CO)6‐derived films on silicon substrates were carried out at total pressure of 5‐10 Torr within the temperature range of 250‐350 °C; in Ar or H2 flow. Metallic, carbide and oxide phases composed the obtained films. Deposition in presence of hydrogen results in the increase of the metal content in the film. Sublimed palladium hexafluoracetylacetonate Pd(hfa)2 was used for Pd catalytic promotion of the deposition process. Codeposition with Pd(hfa)2 in hydrogen increases W‐metal fraction and oxygen content while the Pd content is up to 10 at.%. Influence of vacuum ultraviolet (VUV) radiation from Xe excimer lamp (λ ∼172 nm) on the quality of the obtained films was investigated. It was found that VUV irradiation can reduce the oxygen‐content in the film while W‐metal fraction slightly increases. In all films, oxygen was in the form of WO3 and carbon was mainly incorporated as a graphite metastable phase. The influence of other chemical additives is discussed. (© 2015 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
