Abstract
High-temperature annealing of semi-insulating GaAs has been studied. Thermal conversion induced by annealing at 1060–1200 °C can be explained by the causes of both the reduction of EL2 concentration and the generation of deep acceptors during high-temperature annealing. Both of them can be rationalized by the supposition that the antisite defect, AsGa, breaks into AsI and VGa, and the latter is a deep acceptor.
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