Abstract
The thermal conductivity of amorphous silicon thin films is determined by using the non-intrusive, in situ optical transmission measurement as well as by the 3 ω method. The temperature dependence of the film complex refractive index is determined by spectroscopic ellipsometry. The acquired transmission signal is fitted with predictions obtained by coupling conductive heat transfer with multi-layer thin film optics in the optical transmission measurement. The results of the two independent methods are in close agreement.
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