Thermal conductivity measurement of submicrometer-scale silicon dioxide films by an extended micro-Raman method

Abstract

The micro-Raman method is a noncontact and nondestructive method for thin film thermal conductivity measurements. To apply the micro-Raman method, however, the thickness of the film must be at least tens of micrometers. An analytical heat transfer model is presented in this work to extend the micro-Raman measurement method to measure the thermal conductivity of thin films with submicrometer- or nanometer-scale thickness. The model describes the heat transfer process in the thin film and substrate considering the effects of thin film thickness, interface thermal resistance, thermal conductivity of the thin film and substrate. From this heat transfer model, an analytical expression for the thermal conductivity of the thin film is derived. Experiments were successfully performed to measure the thermal conductivity of 200, 300 and 500 nm thickness silicon dioxide films using the extended micro-Raman measurement method, with results confirming the accuracy and validity of the extended model.