Abstract

We presented a series of nickel(II) complexes with iminoketones Ni[R′C(O)CHC(NH)R″]2, where R′, R″=CH3, CF3, C(CH3)3, that could serve as MOCVD precursors for depositing Ni-containing films. By TGA in a helium flow, all the reported compounds show evaporation in a single smooth step with 100% mass loss up to temperature of 210 and 260°C for fluorinated and non-fluorinated ligands, respectively. Saturated vapor pressure of the compounds was measured by flow method, it was revealed that complexes with the fluorinated ligands have close volatility increased in comparison with non-fluorinated ones. Thermodynamic parameters of evaporation ΔHT0 and ΔST0 were determined. Mass spectrometric study of the thermal decomposition of the compounds vapor under conditions of low-pressure CVD showed that thermolysis starts within the temperature range of 270–310°C depending on the ligand.

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