Abstract
AbstractPattern replication and fidelity are crucial during soft lithography process. The flexibility and surface energy of the resist with that of the master mold are among the factors in determining such an effect. In this work, polysilsesquioxane bearing cycloaliphatic‐epoxy spacer of different chain length at tethered positions is synthesized. Pattern replication using soft lithography is made using polymethylmethacrylate (PMMA) as master mold. The thermal and UV‐cured lithographic performances are studied using differential scanning calorimetry (DSC) and thermal gravimetric analysis (TGA). It shows that chain length of spacer induces flexibility and thermal stability. Despite chain flexibility, increase in spacer length results in poor lithographic performance. This can be attributed to the behavior of spreading parameter with different surface energy between the PMMA mold and the polysiloxane resist surfaces.
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