Abstract
This paper examines a microconstruction consisting of nickel (Ni)/chromium (Cr) alloy thin-film. The total length of the microconstruction was 28 mm, the width was 0.2 mm, and the height was designed to be 1 μm. A thin-film of Ni/Cr alloy was co-sputtered on a silicon dioxide wafer patterned with photoresist via a RF magnetron sputtering system. The RF power ratios applied to the 4 inch target of Ni and Cr were 300 W:100 W (3:1), 300 W:150 W (2:1), and 150 W:150 W (1:1). The electrical resistance of the manufactured microconstruction was calculated and measured through Hall measurements. The temperature generated by applying 1–10 V to the microconstruction electrode was observed by using an infrared camera, and was summarized using a linear equation according to the power applied to each sample.
Highlights
Energies 2021, 14, 3217. https://Device miniaturization through microfabrication leads to the development of new functions and performance [1,2,3]
A microconstruction based on Ni/Cr alloy thin-film by co-sputtering could be an excellent alternative to expensive Pt or Au
Pt and Au are high-cost materials that are used as targets for sputtering systems, which are important in microfabrication processes
Summary
Device miniaturization through microfabrication leads to the development of new functions and performance [1,2,3]. Microconstructions of platinum (Pt) or gold (Au) are robust, stable and can provide a wide temperature range because they have a low coefficient of thermal expansion (Pt: 8.8 ppm/K, Au: 16.5 ppm/K) and resistivity (Pt: 10.9 μΩcm, Au: 2.40 μΩcm) [12,13,14,15]. These materials are too expensive to be used as targets for sputtering systems, which is an important part of the microfabrication process [16]. The heating characteristics were confirmed by applying 1–10 V to the microconstruction electrode and these were expressed as a linear regression equation
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