Abstract

Maxwell's wave equation was solved for fs laser drilling of silicon. The pre-formed hole wall's influence on the propagation behavior of subsequent laser pulses was investigated. The laser intensity at hole bottom shows distinct profile as compared with that at hole entrance. The multi-peaks and ring structure of the laser intensity were found at hole bottom. The position of maximum laser intensity (MLI) in relation to the wall taper angle was studied. It was found that the position of the MLI point would be closer to the hole entrance with increasing taper angle. This observation provides valuable information in predicting the position of plasma plume which is a key factor influencing laser drilling process. The elliptical entrance hole shape and zonal structure at the hole bottom reported in the literatures have been reasonably explained using the laser intensity distribution obtained in the present model.

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