Abstract
Using density functional theory calculations, we explored the potential of defective MoS2 sheets decorated with a series of single transition-metal (TM) atoms as electrocatalysts for the N2 reduction reaction (NRR). The computed reaction free-energy profiles reveal that the introduction of embedded single TM atoms significantly reduces the difficulty to break the N≡N triple bond and thus facilitates the activation of inert nitrogen. Onset potential close to -0.6 V could be achieved by anchoring various TMs, such as Sc, Ti, Cu, Hf, Pt, and Zr, and the formation of the second ammonia molecule limits the overall process. The Ti-decorated nanosheet possesses the lowest free-energy change of -0.63 eV for the potential determining step. To better predict the catalysis performance, we introduced a descriptor, φ, which is the product of the number of valence electron and electronegativity of the decorated TM. It shows a good linear relationship between the d-band center and binding energy of nitrogen, except for those metals with less than half-filled d-band. Although the metals in Group IIIB and IVB have strong adsorption interactions with N atoms, the Gibbs free-energy changes for desorption of the second ammonia are unexpectedly low. The selectivity of these systems toward nitrogen reduction reaction (NRR) is also significantly improved. Therefore, those defective MoS2 decorated with Sc, Ti, Zr, and Hf are suggested as promising electrocatalysts for NRR, for their both high efficiency and selectivity.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.