Abstract
Dependence of efficiency in all-optical poling with nonlinear processes, up to eighth order, is considered. The explicit form of the nonlinear susceptibility that is responsible for the poling is derived, which shows both CEP and phase mismatch dependence. On the basis of an analysis of pulse propagation in a nonlinear material, it is shown that one can identify the order of nonlinearity that is relevant to the poling process, relying on current technology of CEP stabilization and thin-film growth.
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