Theoretical Characterizations on the Eco-Friendly Gas Tetrafluoropropyne for Electrical Insulation to Replace Sulfur Hexafluoride.

Abstract

Gases for electric insulation are essential for various types of high-voltage power equipment. Sulfur hexafluoride (SF6) has been a dielectric medium commonly used in electrical grids for decades but it is the most potent industrial greenhouse gas. The continuous increase of SF6 emissions in the atmosphere exerts a significant impact on global warming. The identification of suitable drop-in replacements for all SF6-filled apparatuses has been elusive experimentally and theoretically. We claim that tetrafluoropropyne, C3F4, is a breakthrough in chemical alternatives to SF6. The performance of C3F4 was assessed systematically in a 6-dimensional manner, including dielectric strength, liquefaction temperature, global warming potential, thermal stability, toxicity, and arc interruption. On the basis of the extensive ab initio calculations, it has been demonstrated rigorously that C3F4 is an environmentally sustainable solution that may fulfill the complex combination of performance, stability, safety, and environmental properties, namely, the dielectric strength is about 50% higher than that of SF6, the boiling point is -50 °C, the GWP for 100 year time horizons is only 3, the decomposition temperature is above 600 °C, the toxicity is as low as HFOs, and the interruption capability is two-thirds of SF6. Two protocols are suggested for the practical use of C3F4. First, equivalence to 0.5 MPa SF6 could be obtained by filling 0.33 MPa C3F4 pure gas and lead minimum operating temperature down to -21 °C. Second, by taking advantage of synergism effect, the 40% C3F4/60% CO2 mixture is a viable alternative to SF6 with the operating temperature -30 °C without causing any environmental and safety concerns. The present theoretical work sheds new light on the challenging topic of the development of alternative dielectric gases and may stimulate experimental tests on the electrical applications of C3F4 in the future.