Abstract
A new development rate equation is proposed which is based on an equation derived by Huang, Reiser and Kwei for the concentration dependence of the dissolution rate of acidic resins in aqueous alkaline developers. This equation predicts cessation of development at a critical concentration c*. An S-shaped function is proposed for the dependence of the critical concentration c* on the normalized sensitizer concentration m of positive-tone resists, and the model is tested with good success on a high speed and a high resolution i-line photoresist.
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