Abstract
The channel avalanche breakdown in GaAs MESFET's has been investigated using nonstationary electron dynamics and an ionization coefficient taken as a function of average electron energy. Stationary high-field domains of different shapes and peak-field localization are calculated at the breakdown, depending on technological parameters, device geometry or gate bias. Design rules are given to obtain maximum saturated output power and a full-channel current breakdown voltage comparable to the one near pinchoff. In particular, it is found that both a recessed channel geometry and an increased gate-drain distance should yield the best device performances with a doping level not higher than about 1.2-10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">17</sup> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">-3</sup> and a channel current I <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">dss</inf> between 275 and 330 mA/mm.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
