Abstract
Thin film deposition using plasma sputter is done by experimental methods, though Numerical simulation and theory are capable of generating realistic and useful results. In present exploration a theoretical model for sputtering with consequence of different plasma parameters with the help of electromagnetic lenses for planar ( T p ) and cylindrical ( T c ) magnetron sputteringhas been conversed. The plasma of helium gas on nickel metal objectwhich contains the velocity shear instability is considered, and T p , T c , under the influence of shear scale length(A i ), homogeneous DC electric field(E 0 ), magnetic field (B 0 ), density gradient ( e n r i ) have been evaluated. T p , and T c are found to be maximum in the range of 0.815–0.91, and 0.57–0.90, respectively. Also growth rate showed direct relation to E 0 and A i but inversely varies with B 0 and e n r i .
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