Abstract
A new high resolution X-ray microscopy project has been proposed at Saga synchrotron light source, which is a third generation synchrotron light facility in Japan. Two microscopy beamlines are planned for this project. One is a scanning microscope in the water window region, and the other is a full-field imaging microscope in the multi-keV X-ray energy region. To demonstrate the feasibility of the project, the optical layout of the scanning microscope was designed. The beamline mainly consists of a 3.5 cm periodical undulator, a varied line-spacing plane grating monochorometer (600 lines/mm) and an end-station including a zone plate. Thus, the calculated X-ray properties focused on the sample position are as follows: the spot size is ∼70 nm, the monochromaticity is -2000, and the photon flux is 10 9 ∼ 10 10 photons/sec.
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